Your daily dose of photovoltaic technology developments and solar news

• Popular Technical Papers

  • Overview of automation in the photovoltaic industry
  • Understanding moisture ingress and packaging requirements for photovoltaic modules
  • Evaluation of encapsulant materials for PV applications
  • Inline processing of crystalline silicon solar cells: the holy grail for large-scale manufacturing?
  • PV sector outlook: an analyst’s perspective

• Featured Technical Papers

  • Transparent conducting oxide deposition techniques for thin-film photovoltaics
  • Comprehensive and advanced quality assurance measures for optimal yields from PV power plants
  • Surface passivation of silicon solar cells using industrially relevant Al2O3 deposition techniques
  • Influence of a-Si:H deposition temperature on thermal stability of a-Si:H/SiNx:H stacks
  • Integrated loops: a prerequisite for sustainable and environmentally-friendly polysilicon production

Amorphous silicon is one of the most effective materials in passivating silicon interfaces. At Fraunhofer ISE, highly passivating amorphous silicon coatings were developed by an industrially applicable Plasma-Enhanced Chemical Vapour Deposition (PECVD) process. Thin-film stacks of amorphous silicon and SiOx display excellent passivation quality, indicated by effective charge carrier lifetimes ranging from 900 to 1600μs and resulting surface recombination velocities between 9 and 3cm/s-1. The demonstrated temperature stability opens up new application opportunities also for amorphous silicon films in the industrial production of highly efficient solar cell structures, which will be further discussed in this paper.

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